@misc{indiciaeb0acd385075e,
  title = {LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds},
  author = {Huanglong Ji and Botong Zhao and Shujing Lv and Yue Lv},
  year = {2026},
  url = {https://arxiv.org/abs/2608.03078},
  note = {Source identifier: 2608.03078}
}