TY  - RPRT
TI  - LDU-Bench: Multimodal LLM Evaluation for Lithography Defect Understanding under Layout-Varying Circuit Backgrounds
AU  - Huanglong Ji
AU  - Botong Zhao
AU  - Shujing Lv
AU  - Yue Lv
PY  - 2026
UR  - https://arxiv.org/abs/2608.03078
ID  - 2608.03078
ER  -