@misc{indiciae835ed8fbea8d,
  title = {Influence of chemical vapor deposition conditions on N incorporation ratio on vicinal 4H-SiC(000-1) surface: Ab Initio-based approach},
  author = {Wataru Ota and Akira Kusaba and Yoshihiro Kangawa and Keisuke Kurashima and Ichiro Mizushima and Kenji Shiraishi},
  year = {2026},
  url = {https://arxiv.org/abs/2609.28891},
  note = {Source identifier: 2609.28891}
}