TY  - RPRT
TI  - Dynamics of Rough Interfaces in Chemical Vapor Deposition: Experiments and a Model for Silica Films
AU  - Fernando Ojeda
AU  - Rodolfo Cuerno
AU  - Roberto Salvarezza
AU  - Luis Vazquez
PY  - 2000
DO  - 10.1103/physrevlett.84.3125
UR  - https://arxiv.org/abs/cond-mat/0003155
ID  - cond-mat/0003155
ER  -