TY  - RPRT
TI  - Multiparticle Biased DLA with surface diffusion: a comprehensive model of electrodeposition
AU  - Mario Castro
AU  - Rodolfo Cuerno
AU  - Angel Sanchez
AU  - Francisco Dominguez-Adame
PY  - 2000
DO  - 10.1103/physreve.62.161
UR  - https://arxiv.org/abs/cond-mat/0003167
ID  - cond-mat/0003167
ER  -