@misc{indiciae4e927d744821,
  title = {Growth and properties of strained VOx thin films with controlled stoichiometry},
  author = {A. D. Rata and A. R. Chezan and T. Hibma and M. W. Haverkort and L. H. Tjeng and H. H. Hsieh and H. J. Lin and C. T. Chen},
  year = {2003},
  doi = {10.1103/physrevb.69.075404},
  url = {https://arxiv.org/abs/cond-mat/0301263},
  note = {Source identifier: cond-mat/0301263}
}