@misc{indiciaef6935a002c99,
  title = {Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering},
  author = {H. B. Nie and S. Y. Xu and S. J. Wang and L. P. You and Z. Yang and C. K. Ong and J. Li and T. Y. F. Liew},
  year = {2003},
  url = {https://arxiv.org/abs/cond-mat/0305683},
  note = {Source identifier: cond-mat/0305683}
}