@misc{indiciaefc5d3bf064eb,
  title = {Preparation of atomically clean and flat Si(100) surfaces by low-energy ion sputtering and low-temperature annealing},
  author = {J. C. Kim and J. -Y. Ji and J. S. Kline and J. R. Tucker and T. -C. Shen},
  year = {2003},
  doi = {10.1016/s0169-4332(03)00826-2},
  url = {https://arxiv.org/abs/cond-mat/0306397},
  note = {Source identifier: cond-mat/0306397}
}