TY  - RPRT
TI  - Preparation of atomically clean and flat Si(100) surfaces by low-energy ion sputtering and low-temperature annealing
AU  - J. C. Kim
AU  - J. -Y. Ji
AU  - J. S. Kline
AU  - J. R. Tucker
AU  - T. -C. Shen
PY  - 2003
DO  - 10.1016/s0169-4332(03)00826-2
UR  - https://arxiv.org/abs/cond-mat/0306397
ID  - cond-mat/0306397
ER  -