@misc{indiciae6b639ad99cf6,
  title = {The interface between silicon and a high-k oxide},
  author = {Clemens J. Foerst and Christopher R. Ashman and Karlheinz Schwarz and Peter E. Bloechl},
  year = {2004},
  doi = {10.1038/nature02204},
  url = {https://arxiv.org/abs/cond-mat/0402173},
  note = {Source identifier: cond-mat/0402173}
}