TY  - RPRT
TI  - The interface between silicon and a high-k oxide
AU  - Clemens J. Foerst
AU  - Christopher R. Ashman
AU  - Karlheinz Schwarz
AU  - Peter E. Bloechl
PY  - 2004
DO  - 10.1038/nature02204
UR  - https://arxiv.org/abs/cond-mat/0402173
ID  - cond-mat/0402173
ER  -