@misc{indiciae23068b3219f7,
  title = {The effect of low-energy ion-implantation on the electrical transport properties of Si-SiO2 MOSFETs},
  author = {D. R. McCamey and M. Francis and J. C. McCallum and A. R. Hamilton and A. D. Greentree and R. G. Clark},
  year = {2004},
  doi = {10.1088/0268-1242/20/5/007},
  url = {https://arxiv.org/abs/cond-mat/0411185},
  note = {Source identifier: cond-mat/0411185}
}