TY  - RPRT
TI  - The effect of low-energy ion-implantation on the electrical transport properties of Si-SiO2 MOSFETs
AU  - D. R. McCamey
AU  - M. Francis
AU  - J. C. McCallum
AU  - A. R. Hamilton
AU  - A. D. Greentree
AU  - R. G. Clark
PY  - 2004
DO  - 10.1088/0268-1242/20/5/007
UR  - https://arxiv.org/abs/cond-mat/0411185
ID  - cond-mat/0411185
ER  -