TY  - RPRT
TI  - Stoichiometry control of magnetron sputtered Bi$_2$Sr$_2$Ca$_{1-x}$Y$_x$Cu$_2$O$_y$ (0$\le$x$\le$0.5) thin film, composition spread libraries: Substrate bias and gas density factors
AU  - R. J. Sanderson
AU  - K. C. Hewitt
PY  - 2005
DO  - 10.1016/j.physc.2005.06.002
UR  - https://arxiv.org/abs/cond-mat/0504442
ID  - cond-mat/0504442
ER  -