TY  - RPRT
TI  - Control of drop positioning using chemical patterning
AU  - A. Dupuis
AU  - J. Leopoldes
AU  - D. G. Bucknall
AU  - J. M. Yeomans
PY  - 2005
DO  - 10.1063/1.1984098
UR  - https://arxiv.org/abs/cond-mat/0507335
ID  - cond-mat/0507335
ER  -