@misc{indiciae82fceabc72b1,
  title = {Simulation of Arsenic Diffusion During Rapid Thermal Annealing of Silicon Layers Doped with Low-Energy High-Dose Ion Implantation},
  author = {O. I. Velichko and A. M. Mironov and V. A. Tsurko and G. M. Zayats},
  year = {2006},
  url = {https://arxiv.org/abs/cond-mat/0509797},
  note = {Source identifier: cond-mat/0509797}
}