TY  - RPRT
TI  - Simulation of Arsenic Diffusion During Rapid Thermal Annealing of Silicon Layers Doped with Low-Energy High-Dose Ion Implantation
AU  - O. I. Velichko
AU  - A. M. Mironov
AU  - V. A. Tsurko
AU  - G. M. Zayats
PY  - 2006
UR  - https://arxiv.org/abs/cond-mat/0509797
ID  - cond-mat/0509797
ER  -