@misc{indiciae8354bcadc6db,
  title = {Extreme Ultraviolet (EUV) Sources for Lithography based on Synchrotron Radiation},
  author = {G. Dattoli and A. Doria and G. P. Gallerano and L. Giannessi and K. Hesch and H. O. Moser and P. L. Ottaviani and E. Pellegrin and R. Rossmanith and R. Steininger and V. Saile and J. Wuest},
  year = {2001},
  doi = {10.1016/s0168-9002(01)00887-7},
  url = {https://arxiv.org/abs/physics/0103055},
  note = {Source identifier: physics/0103055}
}