@misc{indiciaecd7afd4d2538,
  title = {Atom Lithography with Near-Resonant Light Masks: Quantum Optimization Analysis},
  author = {R. Arun and Offir Cohen and I. Sh. Averbukh},
  year = {2006},
  doi = {10.1103/physreva.81.063809},
  url = {https://arxiv.org/abs/quant-ph/0606145},
  note = {Source identifier: quant-ph/0606145}
}