@misc{indiciae2fbb57948aeb,
  title = {Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat The Diffraction Limit},
  author = {Agedi N. Boto and Pieter Kok and Daniel S. Abrams and Samuel L. Braunstein and Colin P. Williams and Jonathan P. Dowling},
  year = {2000},
  doi = {10.1103/physrevlett.85.2733},
  url = {https://arxiv.org/abs/quant-ph/9912052},
  note = {Source identifier: quant-ph/9912052}
}