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arXiv · 0902.2618

Anomalous diffusion mediated by atom deposition into a porous substrate

Pascal Brault·Christophe Josserand·Jean-Marc Bauchire·Amael Caillard·Christine Charles·Rod W. Boswell
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Abstract

Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time

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Pascal Brault, Christophe Josserand, Jean-Marc Bauchire, Amael Caillard, Christine Charles, Rod W. Boswell. 2009-02-16. Anomalous diffusion mediated by atom deposition into a porous substrate. https://doi.org/10.1103/physrevlett.102.045901

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