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arXiv · 0912.0775

Nanophotonic devices on thin buried oxide Silicon-On-Insulator substrates

Suresh Sridaran·Sunil A. Bhave
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Abstract

We demonstrate a silicon photonic platform using thin buried oxide silicon-on-insulator (SOI) substrates using localized substrate removal. We show high confinement silicon strip waveguides, micro-ring resonators and nanotapers using this technology. Propagation losses for the waveguides using the cutback method are 3.88 dB/cm for the quasi-TE mode and 5.06 dB/cm for the quasi-TM mode. Ring resonators with a loaded quality factor (Q) of 46,500 for the quasi-TM mode and intrinsic Q of 148,000 for the quasi-TE mode have been obtained. This process will enable the integration of photonic structures with thin buried oxide SOI based electronics.

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Suresh Sridaran, Sunil A. Bhave. 2009-12-04. Nanophotonic devices on thin buried oxide Silicon-On-Insulator substrates. https://doi.org/10.1364/oe.18.003850

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