On the operation of a Micropattern Gaseous UV-Photomultiplier in Liquid-Xenon

S. Duval; A. Breskin; R. Budnik; W. T. Chen; H. Carduner; M. Cortesi; J. P. Cussonneau; J. Donnard; J. Lamblin; P. Le Ray; E. Morteau; T. Oger; J. S. Stutzmann; D. Thers

doi:10.1088/1748-0221/6/04/p04007

arXiv · 1101.3747

On the operation of a Micropattern Gaseous UV-Photomultiplier in Liquid-Xenon

S. Duval·A. Breskin·R. Budnik·W. T. Chen·H. Carduner·M. Cortesi·J. P. Cussonneau·J. Donnard·J. Lamblin·P. Le Ray·E. Morteau·T. Oger·J. S. Stutzmann·D. Thers

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Abstract

Operation results are presented of a UV-sensitive gaseous photomultiplier (GPM) coupled through a MgF2 window to a liquid-xenon scintillator. It consisted of a reflective CsI photocathode deposited on top of a THick Gaseous Electron Multiplier (THGEM); further multiplication stages were either a second THGEM or a Parallel Ionization Multiplier (PIM) followed by a MICROMEsh GAseous Structure (MICROMEGAS). The GPM operated in gas-flow mode with non-condensable gas mixtures. Gains of 10^4 were measured with a CsI-coated double-THGEM detector in Ne/CH4 (95:5), Ne/CF4 (95:5) and Ne/CH4/CF4 (90:5:5), with soft X-rays at 173 K. Scintillation signals induced by alpha particles in liquid xenon were measured here for the first time with a double-THGEM GPM in He/CH4 (92.5:7.5) and a triple-structure THGEM/PIM/MICROMEGAS GPM in Ne/CH4 (90:10) with a fast-current preamplifier.

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S. Duval, A. Breskin, R. Budnik, W. T. Chen, H. Carduner, M. Cortesi, J. P. Cussonneau, J. Donnard, J. Lamblin, P. Le Ray, E. Morteau, T. Oger, J. S. Stutzmann, D. Thers. 2011-01-20. On the operation of a Micropattern Gaseous UV-Photomultiplier in Liquid-Xenon. https://doi.org/10.1088/1748-0221%2F6%2F04%2Fp04007

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