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arXiv · 1112.0043

LO-phonon assisted polariton lasing in a ZnO based microcavity

L. Orosz·F. Réveret·F. Médard·P. Disseix·J. Leymarie·M. Mihailovic·D. Solnyshkov·G. Malpuech·J. Zuniga-Pérez·F. Semond·M. Leroux·S. Bouchoule·X. Lafosse·M. Mexis·C. Brimont·T. Guillet
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Abstract

Polariton relaxation mechanisms are analysed experimentally and theoretically in a ZnO-based polariton laser. A minimum lasing threshold is obtained when the energy difference between the exciton reservoir and the bottom of the lower polariton branch is resonant with the LO phonon energy. Tuning off this resonance increases the threshold, and exciton-exciton scattering processes become involved in the polariton relaxation. These observations are qualitatively reproduced by simulations based on the numerical solution of the semi-classical Boltzmann equations.

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L. Orosz, F. Réveret, F. Médard, P. Disseix, J. Leymarie, M. Mihailovic, D. Solnyshkov, G. Malpuech, J. Zuniga-Pérez, F. Semond, M. Leroux, S. Bouchoule, X. Lafosse, M. Mexis, C. Brimont, T. Guillet. 2011-11-30. LO-phonon assisted polariton lasing in a ZnO based microcavity. https://doi.org/10.1103/physrevb.85.121201

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