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arXiv · 1408.6614

Towards Intrinsic Charge Transport in Monolayer Molybdenum Disulfide by Defect and Interface Engineering

Zhihao Yu·Yiming Pan·Yuting Shen·Zilu Wang·Zhun-Yong Ong·Tao Xu·Run Xin·Lijia Pan·Baigeng Wang·Litao Sun·Jinlan Wang·Gang Zhang·Yong Wei Zhang·Yi Shi·Xinran Wang
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Abstract

Molybdenum disulfide is considered as one of the most promising two-dimensional semiconductors for electronic and optoelectronic device applications. So far, the charge transport in monolayer molybdenum disulfide is dominated by extrinsic factors such as charged impurities, structural defects and traps, leading to much lower mobility than the intrinsic limit. Here, we develop a facile low-temperature thiol chemistry to repair the sulfur vacancies and improve the interface, resulting in significant reduction of the charged impurities and traps. High mobility greater than 80cm2 V-1 s-1 is achieved in backgated monolayer molybdenum disulfide field-effect transistors at room temperature. Furthermore, we develop a theoretical model to quantitatively extract the key microscopic quantities that control the transistor performances, including the density of charged impurities, short-range defects and traps. Our combined experimental and theoretical study provides a clear path towards intrinsic charge transport in two-dimensional dichalcogenides for future high-performance device applications.

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Zhihao Yu, Yiming Pan, Yuting Shen, Zilu Wang, Zhun-Yong Ong, Tao Xu, Run Xin, Lijia Pan, Baigeng Wang, Litao Sun, Jinlan Wang, Gang Zhang, Yong Wei Zhang, Yi Shi, Xinran Wang. 2014-08-28. Towards Intrinsic Charge Transport in Monolayer Molybdenum Disulfide by Defect and Interface Engineering. https://doi.org/10.1038/ncomms6290

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