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arXiv · 1501.03843

Optimizing the Optical and Electrical Properties of Graphene Ink Thin Films by Laser-annealing

Sepideh Khandan Del·Rainer Bornemann·Andreas Bablich·Heiko Schäfer-Eberwein·Jiantong Li·Torsten Kowald·Mikael Östling·Peter Haring-Bolívar·Max. C. Lemme
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Abstract

We demonstrate a facile fabrication technique for graphene-based transparent conductive films. Highly flat and uniform graphene films are obtained through the incorporation of an efficient laser annealing technique with one-time drop casting of high-concentration graphene ink. The resulting thin films are uniform and exhibit a transparency of more than 85% at 550 nm and a sheet resistance of about 30 kΩ/sq. These values constitute an increase of 45% in transparency, a reduction of surface roughness by a factor of four and a decrease of 70% in sheet resistance compared to unannealed films.

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Sepideh Khandan Del, Rainer Bornemann, Andreas Bablich, Heiko Schäfer-Eberwein, Jiantong Li, Torsten Kowald, Mikael Östling, Peter Haring-Bolívar, Max. C. Lemme. 2015-01-15. Optimizing the Optical and Electrical Properties of Graphene Ink Thin Films by Laser-annealing. https://doi.org/10.1088/2053-1583%2F2%2F1%2F011003

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