SearcharxivSearch

arXiv subjects

Max. C. Lemme

Publications and source records attributed to Max. C. Lemme.

2 recordsLinked to original sources

Facile Synthesis and On-Chip Color Tuning of CsPbBr$_{3}$@CsPbBr$_{3-x}$TFA$_{x}$ Nanoplatelets via Ion Engineering

Metal halide perovskites (MHPs) have emerged as attractive optoelectronic materials because of high fluorescence quantum yield, broad color tunability, and excellent color purity. However, the ionic nature of MHPs makes them susceptible to polar solvents, leading to defect-induced nonradiative recombination and photoluminescence (PL) quenching. Here, we present a combined in-synthesis ($\textit{in situ}$) and post-synthesis ion engineering to suppress nonradiative recombination and integrate multicolor MHP arrays on-chip through a perovskite-compatible photolithography process and $\textit{in situ}$ vapor-phase anion exchange. CsPbBr$_{3}$@CsPbBr$_{3-x}$TFA$_{x}$ nanoplatelets were grown on-chip via a single-step solution process incorporating trifluoroacetate (TFA$^{-}$) pseudohalides. X-ray photoelectron spectroscopy revealed that TFA$^{-}$ passivate uncoordinated Pb$^{2+}$ ions on nanoplatelet surface and suppresses the formation of metallic lead (Pb$^{0}$). This decreases the non-radiative recombination centers and yields a PL peak at 520 nm with a linewidth of 14.56$\% \pm$ 0.5 nm. The nanoplatelets were patterned via a top-down photolithography process and selectively masked with a PMMA/Al$_{2}$O$_{3}$ stack to enable vapor-phase anion exchange. The PL peak shifted in the unmasked regions from 520 nm to 413 nm, resulting in distinct green and blue emission arrays. Our method enables the scalable fabrication of highly luminescent, two-color MHP arrays with tailored optical properties, advancing their integration into next-generation optoelectronic devices.

cond-mat.mtrl-sci

Optimizing the Optical and Electrical Properties of Graphene Ink Thin Films by Laser-annealing

We demonstrate a facile fabrication technique for graphene-based transparent conductive films. Highly flat and uniform graphene films are obtained through the incorporation of an efficient laser annealing technique with one-time drop casting of high-concentration graphene ink. The resulting thin films are uniform and exhibit a transparency of more than 85% at 550 nm and a sheet resistance of about 30 kΩ/sq. These values constitute an increase of 45% in transparency, a reduction of surface roughness by a factor of four and a decrease of 70% in sheet resistance compared to unannealed films.

cond-mat.mtrl-sci