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arXiv · 1503.08977

Deposition and characterization of TiZrV-Pd thin films by dc magnetron sputtering

Jie Wang·Bo Zhang·Yan-Hui Xu·Wei Wei·Le Fan·Xiang-Tao Pei·Yuan-Zhi Hong·Yong Wang
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Abstract

TiZrV film is mainly applied in the ultra-high vacuum pipe of storage ring. Thin film coatings of palladium which was added onto the TiZrV film to increase the service life of nonevaporable getters and enhance pumping speed for H2, was deposited on the inner face of stainless steel pipes by dc magnetron sputtering using argon gas as the sputtering gas. The TiZrV-Pd film properties were investigated by atomic force microscope (AFM), scanning electron microscope (SEM), X-ray photoelectron spectroscopy (XPS) and X-Ray Diffraction (XRD). The grain size of TiZrV and Pd film were about 0.42~1.3 nm and 8.5~18.25 nm respectively. It was found that the roughness of TiZrV films was small, about 2~4 nm, for Pd film it is large, about 17~19 nm. PP At. % of Pd in TiZrV/Pd films varied from 86.84 to 87.56 according to the XPS test results.

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Jie Wang, Bo Zhang, Yan-Hui Xu, Wei Wei, Le Fan, Xiang-Tao Pei, Yuan-Zhi Hong, Yong Wang. 2015-03-31. Deposition and characterization of TiZrV-Pd thin films by dc magnetron sputtering. https://doi.org/10.1088/1674-1137%2F39%2F12%2F127007

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