arXiv · 1601.01224
Transfer Printing of CVD Graphene FETs on Patterned Substrates
Abstract
We describe a simple and scalable method for the transfer of CVD graphene for the fabrication of field effect transistors. This is a dry process that uses a modified RCA cleaning step to improve the surface quality. In contrast to conventional fabrication routes where lithographic steps are performed after the transfer, here graphene is transferred to a pre-patterned substrate. The resulting FET devices display nearly zero Dirac voltage, and the contact resistance between the graphene and metal contacts is on the order of 910 +- 340 Ohm-micrometer. This approach enables formation of conducting graphene channel lengths up to one millimeter. The resist-free transfer process provides a clean graphene surface that is promising for use in high sensitivity graphene FET biosensors.
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T. S. Abhilash, Roberto De Alba, Nikolay Zhelev, Harold G Craighead, Jeevak M Parpia. 2016-01-06. Transfer Printing of CVD Graphene FETs on Patterned Substrates. https://doi.org/10.1039/c5nr03501e
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