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arXiv · 1604.06451

Lithography-Free, Low-Cost Method for Improving Photodiode Performance by Etching Silicon Nanocones as Antireflection Layer

Jing Jiang·Zhida Xu·Jiahao Lin·Gang Logan Liu
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Abstract

A three-step process has been demonstrated to improve the performance of photodiode by creating nanocone forest on the surface of photodiode as an antireflection layer. This high-throughput, low-cost process has been shown to decrease the reflectivity by 66.1%, enhance the quantum efficiency by 27%, and increase the responsivity by 25.7%. This low-cost manufacture process can be applied to increase the responsivity of silicon based photonic devices.

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Jing Jiang, Zhida Xu, Jiahao Lin, Gang Logan Liu. 2016-04-21. Lithography-Free, Low-Cost Method for Improving Photodiode Performance by Etching Silicon Nanocones as Antireflection Layer. https://doi.org/10.1155/2016%2F4019864

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