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arXiv · 1610.07813

Stress engineering with silicon nitride stressors for Ge-on-Si lasers

Jiaxin Ke·Lukas Chrostowski·Guangrui Xia
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Abstract

Side and top silicon nitride stressors were proposed and shown to be effective ways to reduce the threshold current Ith and improve the wall-plug efficiency {\eta}wp of Ge-on-Si lasers. Side stressors only turned out to be a more efficient way to increase {\eta}wp than using top and side stressors together. With the side stressors only and geometry optimizations, a {\eta}wp of 30.5% and an Ith of 50 mA (Jth of 37 kA/cm2) can be achieved with the defect limited carrier lifetime of 1 nsec. With the defect limited carrier lifetime of 10 nsec, an Ith of 7.8 mA (Jth of 5.8 kA/cm2) and a wall-plug efficiency of 38.7% can be achieved. These are tremendous improvements from the case without any stressors. These results give strong support to the Ge-on-Si laser technology and provide an effective way to improve the Ge laser performance.

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Jiaxin Ke, Lukas Chrostowski, Guangrui Xia. 2016-10-25. Stress engineering with silicon nitride stressors for Ge-on-Si lasers. https://arxiv.org/abs/1610.07813

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