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arXiv · 1712.03837

Deterministic integration of quantum dots into on-chip multi-mode interference beamsplitters using in-situ electron beam lithography

Peter Schnauber·Johannes Schall·Samir Bounouar·Theresa Höhne·Suk-In Park·Geun-Hwan Ryu·Tobias Heindel·Sven Burger·Jin-Dong Song·Sven Rodt·Stephan Reitzenstein
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Abstract

The development of multi-node quantum optical circuits has attracted great attention in recent years. In particular, interfacing quantum-light sources, gates and detectors on a single chip is highly desirable for the realization of large networks. In this context, fabrication techniques that enable the deterministic integration of pre-selected quantum-light emitters into nanophotonic elements play a key role when moving forward to circuits containing multiple emitters. Here, we present the deterministic integration of an InAs quantum dot into a 50/50 multi-mode interference beamsplitter via in-situ electron beam lithography. We demonstrate the combined emitter-gate interface functionality by measuring triggered single-photon emission on-chip with $g^{(2)}(0) = 0.13\pm 0.02$. Due to its high patterning resolution as well as spectral and spatial control, in-situ electron beam lithography allows for integration of pre-selected quantum emitters into complex photonic systems. Being a scalable single-step approach, it paves the way towards multi-node, fully integrated quantum photonic chips.

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Peter Schnauber, Johannes Schall, Samir Bounouar, Theresa Höhne, Suk-In Park, Geun-Hwan Ryu, Tobias Heindel, Sven Burger, Jin-Dong Song, Sven Rodt, Stephan Reitzenstein. 2017-12-11. Deterministic integration of quantum dots into on-chip multi-mode interference beamsplitters using in-situ electron beam lithography. https://doi.org/10.1021/acs.nanolett.7b05218

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