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arXiv · 1804.08884

The chemical potential and the work function of a metal film on a dielectric substrate

P. P. Kostrobij·B. M Markovych
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Abstract

The chemical potential and the work function of an aluminum film, which (1) is in vacuum and (2) is located on a dielectric substrate is calculated within the model of non-interacting electrons located in an asymmetric rectangular potential well. For the first time in calculating these values for such a model of a metal film, the electroneutrality condition is correctly taken into account. This leads to the correct behavior of these values, namely: if the thickness of the film increases, these characteristics tend to their bulk values.

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P. P. Kostrobij, B. M Markovych. 2018-04-24. The chemical potential and the work function of a metal film on a dielectric substrate. https://doi.org/10.1080/09500839.2019.1605219

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