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arXiv · 1807.02660

Double carrier transport in electron doped region in black phosphorus FET

Kohei Hirose·Toshihito Osada·Kazuhito Uchida·Toshihiro Taen·Kenji Watanabe·Takashi Taniguchi·Yuichi Akahama
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Abstract

The double carrier transport has been observed in thin film black phosphorus (BP) field effect transistor (FET) devices in highly electron doped region. BP thin films with typical thickness of 15 nm were encapsulated by hexagonal boron nitride (h-BN) thin films to avoid degradation by air exposure. Their Hall mobility has reached 5300 cm2/Vs and 5400 cm2/Vs at 4.2 K in the hole and electron doped regions, respectively. The gate voltage dependence of conductivity exhibits an anomalous shoulder structure in electron doped region. In addition, at gate voltages above the shoulder, the magnetoresistance changes to positive, and there appears an additional slow Shubnikov-de Haas oscillation. These results strongly suggest the appearance of the second carriers, which originate from the second subband with localized band edge.

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Kohei Hirose, Toshihito Osada, Kazuhito Uchida, Toshihiro Taen, Kenji Watanabe, Takashi Taniguchi, Yuichi Akahama. 2018-11-06. Double carrier transport in electron doped region in black phosphorus FET. https://doi.org/10.1063/1.5048233

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