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arXiv · 1812.09517

Photoresponsivity enhancement in monolayer MoS$_2$ by rapid O$_2$:Ar plasma treatment

Jakub Jadwiszczak·Gen Li·Conor P. Cullen·Jing Jing Wang·Pierce Maguire·Georg S. Duesberg·James G. Lunney·Hongzhou Zhang
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Abstract

We report up to ten-fold enhancement of the photoresponsivity of monolayer MoS$_2$ by treatment with O$_2$:Ar (1:3) plasma. We characterize the surface of plasma-exposed MoS$_2$ by TEM, Raman and PL mapping and discuss the role of MoO$_x$ in improving the photocurrent generation in our devices. At the highest tested laser power of 0.1 mW, we find ten-fold enhancements to both the output current and carrier field-effect mobility under the illumination wavelength of 488 nm. We suggest that the improvement of electrical performance is due to the surface presence of MoO$_x$ resulting from the chemical conversion of MoS$_2$ by the oxygen-containing plasma. Our results highlight the beneficial role of plasma treatment as a fast and convenient way of improving the properties of synthetic 2D MoS$_2$ devices for future consideration in optoelectronics research.

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Jakub Jadwiszczak, Gen Li, Conor P. Cullen, Jing Jing Wang, Pierce Maguire, Georg S. Duesberg, James G. Lunney, Hongzhou Zhang. 2018-12-22. Photoresponsivity enhancement in monolayer MoS$_2$ by rapid O$_2$:Ar plasma treatment. https://doi.org/10.1063/1.5086726

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