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arXiv · 1910.02898

Fast Fitting of Reflectivity Data of Growing Thin Films Using Neural Networks

Alessandro Greco·Vladimir Starostin·Christos Karapanagiotis·Alexander Hinderhofer·Alexander Gerlach·Linus Pithan·Sascha Liehr·Frank Schreiber·Stefan Kowarik
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Abstract

X-ray reflectivity (XRR) is a powerful and popular scattering technique that can give valuable insight into the growth behavior of thin films. In this study, we show how a simple artificial neural network model can be used to predict the thickness, roughness and density of thin films of different organic semiconductors (diindenoperylene, copper(II) phthalocyanine and $\alpha$-sexithiophene) on silica from their XRR data with millisecond computation time and with minimal user input or a priori knowledge. For a large experimental dataset of 372 XRR curves, we show that a simple fully connected model can already provide good predictions with a mean absolute percentage error of 8-18 % when compared to the results obtained by a genetic least mean squares fit using the classical Parratt formalism. Furthermore, current drawbacks and prospects for improvement are discussed.

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Alessandro Greco, Vladimir Starostin, Christos Karapanagiotis, Alexander Hinderhofer, Alexander Gerlach, Linus Pithan, Sascha Liehr, Frank Schreiber, Stefan Kowarik. 2019-10-07. Fast Fitting of Reflectivity Data of Growing Thin Films Using Neural Networks. https://arxiv.org/abs/1910.02898

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