Integrating Graphene into Semiconductor Fabrication Lines

Daniel Neumaier; Stephan Pindl; Max C. Lemme

doi:10.1038/s41563-019-0359-7

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arXiv · 1912.04090

Integrating Graphene into Semiconductor Fabrication Lines

Daniel Neumaier·Stephan Pindl·Max C. Lemme

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Abstract

Electronic and photonic devices based on the two-dimensional material graphene have unique properties, leading to outstanding performance figures-of-merit. Mastering the integration of this new and unconventional material into an established semiconductor fabrication line represents a critical step for pushing it forward towards commercialization.

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Daniel Neumaier, Stephan Pindl, Max C. Lemme. 2019-12-09. Integrating Graphene into Semiconductor Fabrication Lines. https://doi.org/10.1038/s41563-019-0359-7

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