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arXiv · 2002.02320

Robust optical-levitation-based metrology of nanoparticle's position and mass

Yu Zheng·Lei-Ming Zhou·Yang Dong·Cheng-Wei Qiu·Xiang-Dong Chen·Guang-Can Guo·Fang-Wen Sun
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Abstract

Light has shown up an incredibe capability in precision measurement based on opto-mechanic interaction in high vacuum by isolating environment noises. However, there are still obstructions, such as displacement and mass estimation error, highly hampering the improvement of absolute accuracy at the nanoscale. Here, we present a nonlinearity based metrology to precisely measure the position and mass of a nanoparticle with optical levitation under $10^{-5}$ mbar, 6-order of magnitude lower than the electrostatic-force and stochastic-force-based counterparts. By precisely controlling the amplitude of the levitated nanoparticle at the nonlinear regime, we realized a feasible sub-picometer-level position measurement with an uncertainty of $1.0\%$ without the prior information of mass, which can be further applied to weigh the femtogram-level mass with an uncertainty of $2.2\%$. It will also pave the way to construct a well-calibrated opto-mechanic platform in high vacuum for high sensitivity and accuracy measurement in force and acceleration at the nanoscale and the study in quantum superposition at the mesoscopic scale.

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Yu Zheng, Lei-Ming Zhou, Yang Dong, Cheng-Wei Qiu, Xiang-Dong Chen, Guang-Can Guo, Fang-Wen Sun. 2020-02-06. Robust optical-levitation-based metrology of nanoparticle's position and mass. https://doi.org/10.1103/physrevlett.124.223603

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