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arXiv · 2002.07390

The Layer-inserting Growth of Antiferromagnetic Topological Insulator MnBi$_2$Te$_4$ Based on Symmetry and Its X-ray Photoelectron Spectroscopy

Abstract

The antiferromagnetic topological insulator has attracted lots of attention recently, as its intrinsic magnetism and topological property makes it a potential material to realize the quantum anomalous Hall effect (QAHE) at relative high temperature. Until now, only MnBi$_2$Te$_4$ is predicted and grown successfully. The other MB$_2$T$_4$-family materials predicted (MB$_2$T$_4$:M=transition-metal or rare-earth element, B=Bi or Sb, T=Te, Se, or S) with not only antiferromagnetic topological property but also rich and exotic topological quantum states and dynamically stable (or metastable) structure have not been realized on experiment completely. Here, MnBi$_2$Te$_4$ single crystals have been grown successfully and tested. It shows typical antiferromagnetic character, with Neel temperature of 24.5K and a spin-flop transition at H$\thickapprox$35000 Oe, 1.8K. After obtaining MnBi$_2$Te$_4$ single crystals, we have tried to synthesize the other members of MB$_2$T$_4$-family materials, but things are not going so well. Then it inspires us to discuss the growth mechanism of MnBi$_2$Te$_4$. The growth mode may be the layer-inserting growth mode based on symmetry, which is supported by our X-ray photoelectron spectroscopy (XPS) measurement. The XPS measurement combing with the $Ar^+$ ion sputtering is done to investigate the chemical state of MnBi$_2$Te$_4$. Binding energies (BE) of the MnBi$_2$Te$_4$-related contributions to Mn2p and Te3d spectra agree well with those of inserting material $\alpha$-MnTe. Rising intensity of the Mn2p satellite for divalent Mn (bound to chalcogen) with atomic number of ligand (from MnO to MnBi$_2$Te$_4$) has been observed, thus suggesting classification of MnBi$_2$Te$_4$ as the charge-transfer compound. Understanding the growth mode of MnBi$_2$Te$_4$ can help us to grow the other members of MB$_2$T$_4$-family materials.

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Fei Jiao, Jingfeng Wang, Xianyu Wang, Meixia Chang, Lingbo Cai, Shu Zhu, Di Zhang, Qing Lu, Cao Wang, Shugang Tan, Yunlong Li, Jiayuan Hu, Qiang Jing, Bo Liu, Dong Qian. 2020-02-18. The Layer-inserting Growth of Antiferromagnetic Topological Insulator MnBi$_2$Te$_4$ Based on Symmetry and Its X-ray Photoelectron Spectroscopy. https://arxiv.org/abs/2002.07390

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