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arXiv · 2004.13854

Temperature-Dependent Resistivity of Alternative Metal Thin Films

Marco Siniscalchi·Davide Tierno·Kristof Moors·Zsolt Tokei·Christoph Adelmann
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Abstract

The temperature coefficients of the resistivity (TCR) of Cu, Ru, Co, Ir, and W thin films have been investigated as a function of film thickness below 10 nm. Ru, Co, and Ir show bulk-like TCR values that are rather independent of the thickness whereas the TCR of Cu increases strongly with decreasing thickness. Thin W films show negative TCR values, which can be linked to high disorder. The results are qualitatively consistent with a temperature-dependent semiclassical thin film resistivity model that takes into account phonon, surface, and grain boundary scattering.

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Marco Siniscalchi, Davide Tierno, Kristof Moors, Zsolt Tokei, Christoph Adelmann. 2020-04-28. Temperature-Dependent Resistivity of Alternative Metal Thin Films. https://doi.org/10.1063/5.0015048

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