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arXiv · 2212.02194

Rubidium Focused Ion Beam Induced Platinum Deposition

Yang Li·Sheng Xu·Meltem Sezen·Feray Bakan Misirlioglu·Edgar Vredenbregt
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Abstract

This work presents characterization of focused ion beam induced deposition (FIBID) of platinum using both rubidium and gallium ions. Under similar beam energies, 8.5 keV for Rb$^+$ and 8.0 keV for Ga$^+$, and beam current near 10 pA, the two ion species deposited Pt films at similar rates. Energy-dispersive x-ray spectroscopy shows that the Rb$^+$ FIBID-Pt consists of similar Pt contents with much lower primary ion contents (5% Rb and 27% Ga) than the Ga$^+$ FIBID-Pt. The deposited material was also measured to have a resistivity of $8.1\times 10^4$ $\mathrm{μΩ\cdot cm}$ for the Rb$^+$ FIBID-Pt and $5.7\times 10^3$ $\mathrm{μΩ\cdot cm}$ for the Ga$^+$ FIBID-Pt.

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Yang Li, Sheng Xu, Meltem Sezen, Feray Bakan Misirlioglu, Edgar Vredenbregt. 2022-12-05. Rubidium Focused Ion Beam Induced Platinum Deposition. https://doi.org/10.1116/6.0002609

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