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arXiv · 2304.13760

Reliable micro-transfer printing method for heterogeneous integration of lithium niobate and semiconductor thin films

Tom Vandekerckhove·Tom Vanackere·Jasper De Witte·Stijn Cuyvers·Luis Reis·Maximilien Billet·Günther Roelkens·Stéphane Clemmen·Bart Kuyken
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Abstract

High-speed Pockels modulation and second-order nonlinearities are key components in optical systems, but CMOS-compatible platforms like silicon and silicon nitride lack these capabilities. Micro-transfer printing of thin-film lithium niobate offers a solution, but suspending large areas of thin films for long interaction lengths and high-Q resonators is challenging, resulting in a low transfer yield. We present a new source preparation method that enables reliable transfer printing of thin-film lithium niobate. We demonstrate its versatility by successfully applying it to gallium phosphide and silicon, and provide an estimate of the transfer yield by subsequently printing 25 lithium niobate films without fail.

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Tom Vandekerckhove, Tom Vanackere, Jasper De Witte, Stijn Cuyvers, Luis Reis, Maximilien Billet, Günther Roelkens, Stéphane Clemmen, Bart Kuyken. 2023-04-26. Reliable micro-transfer printing method for heterogeneous integration of lithium niobate and semiconductor thin films. https://arxiv.org/abs/2304.13760

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