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arXiv · 2408.10071

A strategy for fabricating micro-scale freestanding single-crystalline complex oxide device arrays

Huandong Chen·Yang Liu·Harish Kumarasubramanian·Mythili Surendran·Jayakanth Ravichandran
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Abstract

We present a general fabrication strategy for freestanding single-crystalline complex oxide device arrays via wet chemical etching-based microfabrication processes and epitaxial lift-off. Here, we used 0.5Ba(Zr$_{0.2}$Ti$_{0.8}$)O$_3$-0.5Ba(Zr$_{0.7}$Ti$_{0.3}$)O$_3$ (BCZT) as a model relaxor ferroelectric oxide system and La$_{0.7}$Sr$_{0.3}$MnO$_3$ as the sacrificial layer for demonstration. Arrays of SrRuO$_3$ (SRO) / BCZT / SRO ferroelectric capacitor mesas were first defined and isolated on the growth wafer, and then they were released using epitaxial lift-off with lithography-defined surrounding etching holes, after which the freestanding device arrays were integrated onto a glass substrate. Our proposed strategy sheds light on preparing various freestanding single-crystalline oxide devices and paves the way for their heterogeneous integration onto arbitrary substates.

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Huandong Chen, Yang Liu, Harish Kumarasubramanian, Mythili Surendran, Jayakanth Ravichandran. 2024-08-19. A strategy for fabricating micro-scale freestanding single-crystalline complex oxide device arrays. https://doi.org/10.1021/acsaelm.4c01480

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