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arXiv · 2504.11693

Epitaxial formation of ultrathin HfO2 on graphene by sequential oxidation

Zhenjing Liu·Qian Mao·Varun Kamboj·Rishabh Kothari·Paul Miller·Kate Reidy·Adri C. T. van Duin·R. Jaramillo·Frances M. Ross
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Abstract

We demonstrate the formation of epitaxial, ultrathin hafnia (HfO2) on graphene. Monoclinic hafnia (m-HfO2) forms as the end of a series of sequential oxidation reactions. Starting from Hf metal grown epitaxially on graphene, oxidation leads first to an amorphous suboxide (a-HfOx), then to a crystalline, hexagonal suboxide (h-HfOx) in epitaxial relationship with the substrate, and finally to m-HfO2 that is also epitaxial. We use scanning transmission electron microscopy to characterize the epitaxial relationships and to investigate the structure of h-HfOx. We propose a series of displacive transformations that relate the different crystalline phases and are consistent with the observed epitaxial relationships with the graphene substrate. ReaxFF based reactive molecular dynamics simulations confirm our model of the oxide phase sequencing, and illustrate the role of graphene in promoting oxide crystallization. Our results suggest a way to achieve heteroepitaxial integration of high-performance, crystalline dielectrics with two dimensional (2D) semiconductors with an atomically sharp interface, which is also relevant to hafnia phase engineering.

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Zhenjing Liu, Qian Mao, Varun Kamboj, Rishabh Kothari, Paul Miller, Kate Reidy, Adri C. T. van Duin, R. Jaramillo, Frances M. Ross. 2025-04-16. Epitaxial formation of ultrathin HfO2 on graphene by sequential oxidation. https://arxiv.org/abs/2504.11693

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