All Photonic Isolator using Atomically Thin (2D) Bismuth Telluride (Bi2Te3)

Saswata Goswami; Bruno Ipaves; Juan Gomez Quispe; Caique Campos de Oliveira; Surbhi Slathia; Abhijith M. B; Varinder Pal; Christiano J. S. de Matos; Samit K. Ray; Douglas S. Galvao; Pedro A. S. Autreto; Chandra Sekhar Tiwary

arXiv · 2508.03319

All Photonic Isolator using Atomically Thin (2D) Bismuth Telluride (Bi2Te3)

Saswata Goswami·Bruno Ipaves·Juan Gomez Quispe·Caique Campos de Oliveira·Surbhi Slathia·Abhijith M. B·Varinder Pal·Christiano J. S. de Matos·Samit K. Ray·Douglas S. Galvao·Pedro A. S. Autreto·Chandra Sekhar Tiwary

View original source ↗Read source document ↗Export metadata ↓

Abstract

This study demonstrates that two-dimensional (2D) Bi2Te3 exhibits strong light-matter interaction, enabling a broadband Kerr nonlinear optical response. This characteristic is advantageous for nonreciprocal light propagation in passive photonic isolators. Using Spatial Self-Phase Modulation (SSPM) spectroscopy, self-induced diffraction patterns in the far field were observed at excitation wavelengths of 650 nm, 532 nm, and 405 nm to calculate the nonlinear refractive index (n2) and the third-order nonlinear optical susceptibility (chi^(3)) of the synthesized 2D Bi2Te3. The results show that 2D Bi2Te3 possesses a significantly higher nonlinear refractive index than graphene. The laser-induced hole coherence effect is responsible for the large magnitude of the third-order nonlinear susceptibility. Surface engineering techniques were also employed to enhance the response speed of the photonic system. Complementary ab initio simulations were performed to gain further insight into the observed nonlinear behavior. Leveraging the strong Kerr nonlinearity of 2D Bi2Te3, a nonlinear photonic isolator that breaks time-reversal symmetry and enables unidirectional light propagation was demonstrated. This work establishes Bi2Te3 as a novel 2D material for nonlinear photonics, expanding its potential applications in detectors, modulators, and optical switches.

Explore related subjects

physics.optics cond-mat.mes-hall

Keep this discovery

BibTeX RIS

Saswata Goswami, Bruno Ipaves, Juan Gomez Quispe, Caique Campos de Oliveira, Surbhi Slathia, Abhijith M. B, Varinder Pal, Christiano J. S. de Matos, Samit K. Ray, Douglas S. Galvao, Pedro A. S. Autreto, Chandra Sekhar Tiwary. 2025-08-05. All Photonic Isolator using Atomically Thin (2D) Bismuth Telluride (Bi2Te3). https://arxiv.org/abs/2508.03319

Cite the original work for its findings. Save a collection to share your selection of sources.

KEEP EXPLORING

Related papers

arXiv2026

Two-step high-accuracy microwave frequency measurement and time-frequency analysis based on optical frequency combs

Broadband microwave frequency measurement and time-frequency analysis are crucial for applications such as electronic warfare. However, when it comes to ultra wideband signal analysis, traditional electronic methods have high analysis accuracy, but intrinsic electronic bottlenecks limit their real-time analysis. Here, we propose and experimentally demonstrate a two-step microwave frequency measurement and time-frequency analysis method based on optical frequency combs. The system first performs coarse frequency localization over the 0-40 GHz range using stimulated-Brillouin-scattering-assisted frequency-to-time mapping (FTTM) and dual-comb channelized reception. The dual-comb is then reapplied for downconverting the signal under test, followed by digital signal processing to achieve high-accuracy unambiguous frequency extraction. Experimental results show that the system achieves mean single-tone frequency measurement errors of less than 10 kHz over 0-40 GHz. We further experimentally measure multi-tone, linearly frequency-modulated, and V-shaped frequency-modulated signals, demonstrating the proposed method's capability for analyzing complex signals.

physics.optics↗

arXiv2026

A Two-Mirror Faceted Projection System for EUV Lithography

We propose an all-reflective two-mirror projection system for extreme ultraviolet (EUV) lithography operating at exposure wavelengths of $13.5$~nm (Mo/Si) and $11.2$~nm (Ru/Be), delivering a fourfold ($4\times$) demagnification of the periodic mask pattern at a numerical aperture approaching unity ($\mathrm{NA}_{\max} \approx 0.993$). In contrast to conventional EUV projection objectives that incorporate 6--10 aspheric mirrors with an overall optical throughput of less than $15\%$, the proposed design redirects each accepted discrete spatial diffraction order scattered by the mask onto the wafer via a dedicated pair of planar mirror facets. The number of reflections is strictly fixed at two for all accepted orders, retaining $50$--$60\%$ of the power leaving the mask in each accepted order. We derive a spatial geometry providing rigorous optical path length equalization across all diffraction orders, thereby removing order-dependent propagation phase shifts. Individually optimized 30-bilayer Bragg multilayer coatings are designed for each facet using the transfer matrix method combined with global evolutionary optimization algorithms. The architecture is generalized to a three-dimensional vector formulation with a two-dimensionally periodic mask. Utilizing inverse lithography technology, Fourier parameterization, and a differentiable electromagnetic modal waveguide solver, we solve the synthesis problem for binary absorber masks (La absorber on a Ru/Be/Sr multilayer mirror). We demonstrate simulated aerial images of sub-10-nm features on the wafer (isolated peaks with a full width at half maximum (FWHM) of approximately $5.4$~nm and line pairs with a critical dimension of $6$~nm) and find that the two peaks remain resolved for the tested wafer defocus values from $0$ to $5$~nm along the $z$-axis.

physics.optics↗

arXiv2026

Antimony for broadband nanophotonics across the ultraviolet, visible and infrared

Semimetal elemental antimony (Sb) nanostructures show great potential for applications where nanophotonic properties play a key role, such as phase-change optical memories, non-linear optical elements, photothermal therapy agents, photodetectors and photocatalysts. However, designing advanced Sb-based photonic devices critically requires an accurate and reliable knowledge of the optical response of bulk and nanoscale Sb. Herein, we report for the first time a fully consistent and accurately measured dielectric function for Sb nanoscale films in a wide spectral range from the ultraviolet to the far infrared (4 - 0.04 eV, i.e. ~ 0.3 - 30 $\mu$m), surpassing previous reports that explored a limited spectral range. It is found that the Sb spectral response is driven exclusively by giant interband transitions in the visible up to mid infrared (4 - 0.4 eV, i.e. ~ 0.3 - 3 $\mu$m), and that their contribution dominates over that of free carriers down to 0.12 eV (i.e. ~ 10 $\mu$m). Such spectral response enables Sb nanostructures to display spectrally selective and tunable nanophotonic resonances. First, we showcase interband plasmonic resonances in the visible-to-near infrared for Sb nanogratings. Second, we report giant refractive index dielectric resonances in the mid infrared for nanostructured Sb/dielectric/metal resonant cavities. These findings open a pathway to optimized planar Sb nanoscale designs enabling a tailored light-matter interaction, which will be useful for integrated data, telecom, medical, optoelectronic and energy conversion devices operating in a broad spectral range.

physics.optics↗