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arXiv · 2508.06777

Impact of Ge substrate Thicknesses and Epitaxy Growth Conditions on the Optical and Material Properties of Ge- and GaAs-based VCSELs

Wenhan Dong·Zeyu Wan·Yun-Cheng Yang·Chao-Hsin Wu·Yiwen Zhang·Rui-Tao Wen·Guangrui Xia
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Abstract

We present a comparative study of the optical and material property dependences of VCSELs on Ge or GaAs substrate thicknesses and epitaxy process conditions. It was found that adjusting the Ge substrate thickness and optimizing the epitaxy process can shift the stopband center and cavity resonance wavelength by several nanometers. Ge-based VCSELs exhibit improved epitaxial uniformity, smaller deviations from design specifications, reduced stoichiometry variations, and strain magnitudes comparable to those of GaAs-based counterparts. In the selected 46.92 square micron sample area, no defects were observed in the quantum well (QW) regions of Ge-based VCSELs, and the threading dislocation density (TDD) was measured to be below 2.13e6 per square cm. These results highlight the potential of Ge substrates as promising candidates for advanced VCSELs.

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Wenhan Dong, Zeyu Wan, Yun-Cheng Yang, Chao-Hsin Wu, Yiwen Zhang, Rui-Tao Wen, Guangrui Xia. 2025-08-09. Impact of Ge substrate Thicknesses and Epitaxy Growth Conditions on the Optical and Material Properties of Ge- and GaAs-based VCSELs. https://arxiv.org/abs/2508.06777

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