arXiv · 2511.19029
Light-induced photomechanical patterning of ferroelectric polarization
Abstract
Tailoring at will polar textures in ferroelectrics is critical for the development of nanoscale electronics and functional oxide technologies. Freestanding ferroelectric membranes have enabled studies of strain-induced polarization responses, but the control over membrane shape and local polarization typically remains limited to spontaneous buckling or uniaxial mechanical deformations. In this work, we employ a versatile photosensitive-polymer patterning approach to impose programmable bending strain profiles in ferroelectric membranes. Using BaTiO3 as a model system, we demonstrate deterministic 90{\deg} polarization rotation driven by engineered in-plane strain, and 180{\deg} polarization reversal arising from flexoelectric coupling through a controlled strain gradient. These results establish this programmable bending as a powerful approach to investigate strain-dependent domain structures, leverage flexoelectric effects, and engineer custom ferroelectric landscapes across a wide range of oxide membranes.
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Alban Degezelle, Jonas Strobelt, Sarah Loebner, Moussa Mebarki, Stephane Fusil, Vincent Garcia, Bruno Berini, Vincent Polewczyk, Yves Dumont, Sylvia Matzen, Philippe Lecoeur, Svetlana Santer, Thomas Maroutian. 2025-11-24. Light-induced photomechanical patterning of ferroelectric polarization. https://arxiv.org/abs/2511.19029
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