arXiv · 2602.05741
Questioning van der Waals Epitaxy of Non-Layered Materials on Mica: The Case of ScN
Abstract
Growing stress-free epitaxial films by van der Waals epitaxy (vdWE) is of interest for realizing flexible optoelectronics and energy devices from freestanding epilayers. However, vdWE of non-layered materials is often presumed or claimed on layered substrates such as mica with inadequate experimental evidence. Here, we demonstrate that the growth of single-domain rocksalt ScN(111) films by sputter deposition on fluorophlogopite mica(001) occurs by conventional epitaxy. X-ray diffraction and electron microscopy reveal the film/substrate epitaxial relationship to be [-101](111)ScN||[010](001)mica. Our results indicating strain buildup seen from the dependence of (111) interplanar spacings, and strain relaxation by dislocation generation, question prior claims of vdWE of non-layered metal nitrides on mica. Our findings show that conventional epitaxy should be the default assumption for non-layered materials unless conditions for vdWE are explicitly established.
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Susmita Chowdhury, Faezeh Alijan Farzad Lahiji, Mikael Ottoson, Olivier Donzel-Gargand, Robert J. W. Frost, Martin Magnuson, Ganpati Ramanath, Arnaud le Febvrier, Per Eklund. 2026-02-05. Questioning van der Waals Epitaxy of Non-Layered Materials on Mica: The Case of ScN. https://arxiv.org/abs/2602.05741
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