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Per Eklund

Publications and source records attributed to Per Eklund.

At least 19 recordsLinked to original sources

Local coordination, structural softening, and polarization-switching energetics in Sc-alloyed GaN

Sc-alloyed wurtzite nitrides exhibit strongly tunable electromechanical and ferroelectric properties, yet the relationship between their lattice evolution and local bonding environment remains insufficiently established, particularly in Sc$_x$Ga$_{1-x}$N. Here, we investigate the structural and local bonding evolution of Sc$_x$Ga$_{1-x}$N across the dilute-to-intermediate composition range by combining X-ray diffraction, Sc K-edge X-ray absorption near edge structure (XANES), extended X-ray absorption fine structure (EXAFS) and first-principles calculations. Sc incorporation produces an anisotropic lattice expansion and a progressive reduction in the c/a ratio. XANES and EXAFS reveal a concurrent modification of the local environment around Sc, with the effective Sc-N coordination number increasing from 4.1(4) to 4.5(2) and the average Sc-N bond length increasing from 2.045(7) to 2.081(8){\AA} over x=0.06-0.26. The local response is accompanied by a reduction in the Sc K-edge pre-edge intensity, consistent with a gradual reduction of the local tetrahedral asymmetry. First-principles calculations show that these structural changes are associated with site-selective distortions around Sc and progressive flattening of the structural energy landscape. The calculated intrinsic polarization-switching barrier decreases from 24.2 to 19.0 meV/{\AA}$^3$ with increasing Sc content, while the calculated piezoelectric stress coefficient (e$_{33}$) increases from 0.82 to 1.66~C/m$^2$ and elastic constant (C$_{33}$) decreases from 380 to 227~GPa, resulting in an increase of piezoelectric strain coefficient (d$_{33}$) from 2.99 to 12.46~pC/N. These results show that Sc incorporation progressively modifies the local coordination environment and structural energetics of ScGaN while the long-range wurtzite structure remains preserved over the investigated composition range.

cond-mat.mtrl-sci

A single platform with van der Pauw geometry for measurement of Seebeck coefficient, resistivity, and Hall effect of thin films

A modular thermoelectric properties measurement setup in van der Pauw configuration was developed for a straightforward and simultaneous measurement of electrical resistivity and Seebeck coefficient in an extensive temperature range of 25{\deg}C - 600{\deg}C and can also perform Hall measurements at room temperature. The setup is optimized for accurate measurement of voltages and temperatures gradients by minimizing possible errors from offset voltages, wire contributions and thermal contact resistances which helps getting reliable data. The setup is user friendly, and the measurements are fully automated and controlled using a LabVIEW program. The detachable modules make this setup quite versatile and provide an all-in-one (except thermal conductivity) solution for thermoelectric measurements.

physics.ins-det

Chemical Vapor Deposition of Epitaxial Chromium Nitride Thin Films

Chromium nitride (CrN) is a thermoelectric transition metal nitride whose properties are strongly influenced by stoichiometry, substrate choice, and defect chemistry. CrN is routinely synthesized by physical vapor deposition (PVD), its growth by chemical vapor deposition (CVD) has been limited by the lack of suitable chromium precursors capable of producing carbon-, oxygen-, and chlorine-free films. CVD of contamination-free Cr compounds is notoriously difficult, with carbon-free Cr compounds thought unattainable below 1000 C. Here, we report epitaxial, carbon- and chlorine-free CrN thin films synthesized by thermal CVD. Single-phase CrN films (~110 nm) were deposited on c-plane alpha-Al2O3 using in-situ generated chromium chlorides. Films exhibit n-type conduction with a Seebeck coefficient of -36 uV/K, comparable to PVD-grown CrN. These results present a routeto highly crystalline rock-salt CrN films for defect engineering, doping, and alloying with reduced implantation-related damage capabilities previously largely confined to PVD-based techniques.

cond-mat.mtrl-sci

Damage accumulation induced metal-insulator transition through ion implantation of ScN thin films

Ion implantation is a powerful approach for tuning the electrical properties of materials through controlled doping and defect engineering, with applications in thermoelectrics and microelectronics. Scandium nitride (ScN) is particularly sensitive to irradiation-induced disorder, with transport properties spanning several orders of magnitude and multiple conduction mechanisms involved. In this study, we investigate the evolution of electrical transport in epitaxial ScN thin films undergoing accumulated irradiation damage at an initial defect state. A phenomenological damage-accumulation model was successfully combined with temperature dependent resistivity and Hall effect measurements to elucidate the impact of defect buildup on electrical transport and to provide physically grounded, quantitative insight into the nature and accumulation of irradiation-induced defects. It reveals two distinct defects-generation regimes of electrically active defects. At low doses, direct-impact damage produces stable and isolated acceptor-type complex defects, (VSc-X) with VSc a scandium vacancy and X denoting residual impurities, leading to a gradual increase in resistivity. At higher doses, defect accumulation dominates through a multi-hit process, giving rise to point-defect buildup and carrier localization, resulting in hopping-dominated transport. This localized regime is thermally unstable and recovers upon low-temperature annealing. We further demonstrate that the residual defect landscape strongly influences both the critical dose for the metal-insulator transition and the localization strength: films grown on Al2O3 exhibit an earlier transition and weaker localization than those grown on MgO. These results highlight ion implantation as an effective route for engineering disorder-induced localization in ScN, with the initial film quality playing a decisive role.

cond-mat.mtrl-sci

Questioning van der Waals Epitaxy of Non-Layered Materials on Mica: The Case of ScN

Growing stress-free epitaxial films by van der Waals epitaxy (vdWE) is of interest for realizing flexible optoelectronics and energy devices from freestanding epilayers. However, vdWE of non-layered materials is often presumed or claimed on layered substrates such as mica with inadequate experimental evidence. Here, we demonstrate that the growth of single-domain rocksalt ScN(111) films by sputter deposition on fluorophlogopite mica(001) occurs by conventional epitaxy. X-ray diffraction and electron microscopy reveal the film/substrate epitaxial relationship to be [-101](111)ScN||[010](001)mica. Our results indicating strain buildup seen from the dependence of (111) interplanar spacings, and strain relaxation by dislocation generation, question prior claims of vdWE of non-layered metal nitrides on mica. Our findings show that conventional epitaxy should be the default assumption for non-layered materials unless conditions for vdWE are explicitly established.

cond-mat.mtrl-sci

Morphology-engineered nanostructured silver- and antimony-telluride films for flexible thermoelectric generators

Harvesting low-grade heat to electricity is attractive for powering wearable electronic devices. Here, we demonstrate nW-scale thermoelectric power generation in devices from thin film assemblies of microwave-synthesized p-Sb2Te3 nanoplates and n-Ag2Te nanowires on polyvinylidene fluoride membranes. While microwave cycling is crucial for Ag2Te nanocrystal shaping, Sb2Te3 formation is sensitive to precursors and surfactant concentrations. Introducing S doping in Sb2Te3 in the 1 - 1.5 atomic percent range via thioglycolic acid during synthesis yields an up to eightfold higher power-factor, due to a fivefold increase in electrical conductivity and 25% increase in Seebeck coefficient. Our microfilm devices generate up to 33.6 mV from 5 deg C to 50 deg C thermal gradients, with 120 nW maximum power output at Delta T 30 deg C, which is sixtyfold higher than Sb2Te3 paper devices. Mechanical bending can increase device resistance by up to 125% due to diminished inter-nanostructure electronic transport. These findings provide insights for integrating synthesis, morphology engineering and device design for next-generation wearable thermoelectric systems.

cond-mat.mtrl-sci

Robust Superconductivity and High Upper Critical Fields in Epitaxial cubic W2N Thin Films

Transition Metal Nitrides are a versatile class of materials, combining chemical robustness, high hardness, and superconducting behaviour with critical temperatures between 2 to 10 K. While several binary TMNs have been explored, superconductivity in stoichiometric W2N has remained largely unexplored. Here, we report on superconducting thin films of stoichiometric W2N, demonstrating a distinctly high upper critical field of 8.5 T, uncommon among binary TMNs. This robust superconducting response under high magnetic fields highlights the technological relevance of W2N for integrated quantum and cryogenic electronic platforms. Overall, these results position stoichiometric W2N as a promising addition to the TMN superconducting landscape, opening new avenues for functional materials design based on chemically stable and mechanically resilient nitrides.

cond-mat.supr-con

Lattice Mismatch Driven In Plane Strain Engineering for Enhanced Upper Critical Fields in Mo2N Superconducting Thin Films

Transition metal nitrides are a fascinating class of hard coating material that provide an excellent platform for investigating superconductivity and fundamental electron phonon interactions. In this work the structural morphological and superconducting properties have been studied for Mo2N thin films deposited via direct current magnetron sputtering on cplane Al2O3 and MgO substrates to elucidate the effect of internal strain on superconducting properties. High resolution X Ray diffraction and time of flight elastic recoil detection analysis confirms the growth of single phase Mo2N thin films exhibiting epitaxial growth with twin domain structure. Low temperature electrical transport measurements reveal superconducting transitions at 5.2 K and 5.6 K with corresponding upper critical fields of 5 T and 7 T for the films deposited on Al2O3 and MgO, respectively. These results indicate strong type II superconductivity and the observed differences in superconducting properties are attributed to substrate induced strain which leads to higher e ph coupling for the film on MgO substrate. These findings highlight the tunability of superconducting properties in Mo2N films through strategic substrate selection.

cond-mat.supr-con

Fermiology and Band Structure of Oxygen-Terminated Ti3C2Tx MXene

The class of two-dimensional carbides and nitrides known as MXenes exhibit remarkable electronic properties. Tailoring these properties, however, requires an in-depth understanding of the band structure and Fermi-surface topology. Surface oxidation of MXenes has previously hampered the characterization of their Fermi surface, which is crucial for understanding the topology and anisotropy in the electronic structure and, ultimately, for tailoring electronic properties. Here, we reveal the Fermi surface topology and band structure of purely oxygen-terminated Ti3C2Tx MXene achieved through rigorous thin film sample preparation and ultrahigh vacuum annealing. Polarized synchrotron radiation-based angle-resolved photoemission spectroscopy reveals electron pockets, bulk band gaps, and a Dirac-like feature in the anisotropic electronic band structure. This paves the way for a fundamental understanding of band engineering of electronic transport properties, providing insights of importance for energy storage devices, transparent conductors, and catalysis.

cond-mat.mtrl-sci

Electron-phonon interactions and tensor analysis in topological insulator bismuth telluride using angle resolved polarized Raman spectroscopy

We report on the angle-resolved polarized Raman spectroscopy and estimation of the Raman tensor elements using both classical and quantum treatments to analyse the polarized Raman spectra of single crystal Bismuth Telluride. The observed polar patterns and systematic variations in the relative intensities of four characteristic Raman active modes indicate a higher differential polarizability along the c-axis, accompanied by anisotropic photon-phonon interactions. This interplay of electron-photon-phonon interactions is crucial for understanding the lattice dynamics of Bismuth Telluride, which underpin its thermoelectric performance and topological properties.

cond-mat.mtrl-sci

Phase selection and texturing in molybdenum oxide films grown by reactive magnetron sputtering

Molybdenum oxide films offer a rich variety of properties for diverse applications, but exclusive synthesis of desired phases is a major challenge. Here, we demonstrate that oxygen flow ratio fO2 = [O2]/[Ar+O2] is crucial not only for phase selection of non-layered monoclinic MoO2 and layered orthorhombic alpha-MoO3 but also for controlling grain size and preferred orientation. Both mica and sapphire support exclusive MoO2 formation in the 0.15 < fO2 < 0.25 window at deposition temperatures Tdep = 400 and 500 degree C and alpha-MoO3 formation in the 0.35 < fO2 < 0.5 window at 400 degree C. Within fO2 windows favoring exclusive phase formation, high fO2 fosters large grains with out-of-plane 0k0 texture, except for MoO2 films on c-sapphire that show no systematic trends. These findings provide a framework for rational synthesis of phase-pure monoclinic MoO2 and orthorhombic MoO3 with control over texture and microstructure to access desired properties.

cond-mat.mtrl-sci

Atomistic mechanism and interface-structure-energetics of van der Waals epitaxy demonstrated by layered alpha-MoO3 growth on mica

Unlike conventional epitaxy, van der Waals epitaxy (vdWE) allows nearly stress-free growth of thick films with highly oriented crystals without dislocations even for large film-substrate lattice mismatches. Despite reports of vdWE in numerous materials systems, an atomistic understanding of film/substrate interface structure that explains and predicts vdWE has remained elusive. Here, we address this knowledge gap by unveiling atomistic interface mechanisms for vdWE of alpha-MoO3(0k0) on mica(001). X-ray diffraction and electron microscopy reveal alpha-MoO3(0k0) epilayers with large columnar crystals in three non-equivalent in-plane orientations. These results, together with negligible strain buildup in continuous epilayers, confirm vdWE. Ab initio computations showing interface energy minima for these orientations correlate with high cross-interface proximity between Mo atoms in alpha-MoO3 and K in mica conducive for maximal vdW attraction. These atomistic insights on interface structure and energetics provide a crucial framework for predicting vdWE for different film/substrate combinations and designing of stress-free and/or standalone epitaxial films of layered materials such as MoO3 on layered substrates such as f-mica.

cond-mat.mtrl-sci

The Role of 11B4C Interlayers in Enhancing Fe/Si Multilayer Performance for Polarized Neutron Mirrors

This study investigates the effects of incorporating 11B4C interlayers into Fe/Si multilayers, with a focus on interface quality, reflectivity, polarization, and magnetic properties for polarized neutron optics. It is found that the introduction of 1 {\AA} and 2 {\AA} 11B4C interlayers significantly improves the interface sharpness, reducing interface width and preventing excessive Si diffusion into the Fe layers. X-ray reflectivity and polarized neutron reflectivity measurements show enhanced reflectivity and polarization, with a notable increase in polarization for 30 {\AA} period multilayers. The inclusion of interlayers also helps prevent the formation of iron-silicides, improving both the magnetic properties and neutron optical performance. However, the impact of interlayers is less pronounced in thicker-period multilayers (100 {\AA}), primarily due to the ratio between layer and interface widths. These results suggest that 11B4C interlayers offer a promising route for optimizing Fe/Si multilayer performance in polarized neutron mirrors.

cond-mat.mtrl-sci

Persistent Uncorrelated Magnetic Domains in Fe/Si Multilayers and their suppression by incorporating 11B4C

This study investigates magnetic domains in Fe/Si and Fe/Si + B4C multilayers using spin flip off-specular polarized neutron reflectometry. The results show that Fe/Si multilayers exhibit pronounced spin flip off-specular scattering originating from magnetic domains that are uncorrelated out of plane. With increasing external magnetic field the domains progressively coalesce and their magnetization rotates toward alignment with the applied field, approaching a homogeneous magnetic state at higher fields. In contrast, Fe/Si + B4C multilayers exhibit no detectable spin flip off-specular scattering already at low fields, indicating that the multilayer reaches magnetic saturation at significantly lower applied fields. The scattering patterns are interpreted using distorted wave Born approximation simulations in BornAgain, enabled by our added code for simulating magnetic domains and magnetic ordering. To further probe the magnetic behavior, low-energy mu+SR measurements were performed, representing the first mu+SR investigation of polarizing neutron optics multilayers. Together with comparison to previously reported VSM data, these measurements provide insight into the magnetic behavior across short range, medium range, and long range length scales. The results show that incorporating approximately 15 vol.% B4C makes the magnetic configuration highly responsive to external magnetic fields, with clear sensitivity to both in-plane and out-of-plane field geometries. These results show that B4C suppresses magnetic domains and spin flip off-specular scattering, improving Fe/Si coatings for neutron polarization optics in regards to off-specular scattering, and other applications requiring easy magnetic manipulation.

cond-mat.mtrl-sci

Physico-thermal and geochemical behavior and alteration of the Au indicator gangue hydrothermal quartz at the Kubi Gold Ore Deposits

Altered and gangue quartz in hydrothermal veins from the Kubi Gold deposit in Dunkwa on Offin in the central region of Ghana are investigated for possible Au-associated indicator minerals and to provide the understanding and increase the knowledge of the mineral hosting and alteration processes in quartz. X-ray diffraction, air annealing furnace, differential scanning calorimetry, energy dispersive X-ray spectroscopy, and transmission electron microscopy have been applied on different quartz types outcropping from surface and bedrocks at the Kubi Gold Mining to reveal the material properties at different temperatures. From the diffraction results of the fresh and annealed quartz samples, we find that the samples contain indicator and the impurity minerals iron disulfide, biotite, titanium oxide, and magnetite. These minerals, under oxidation process between 574-1400 {\deg}C temperatures experienced hematite alterations and a transformation from {\alpha}-quartz to \b{eta}-quartz and further to cristobalite as observed from the calorimetry scans for hydrothermally exposed materials. The energy dispersive spectroscopy revealed elemental components of Fe, S, Mg, K, Al, Ti, Na, Si, O, and Ca contained in the samples, and these are attributed to the impurity phase minerals observed in the diffraction. The findings also suggest that during the hydrothermal flow regime, impurity minerals and metals can be trapped by voids and faults. Under favorable temperature conditions, the trapped minerals can be altered to change color at different depositional stages by oxidation and reduction processes leading to hematite alteration which is a useful indicator mineral in mineral exploration.

physics.geo-ph

Electronic structure and thermoelectric properties of epitaxial Sc1-xVxNy thin films grown on MgO(001)

The electronic structure of Sc1-xVxNy epitaxial films with different alloying concentrations of V are investigated with respect to effects on thermoelectric properties. Band structure calculations on Sc0.75V0.25N indicate that V 3d states lie in the band gap of the parent ScN compound in the vicinity of the Fermi level. Thus, theoretically the presence of light (dispersive) bands at the {\Gamma}-point with band multiplicity is expected to lead to lower electrical resistivity while flat (heavy) bands at X-W-K symmetry points are associated with higher Seebeck coefficient than that of ScN. With this aim, epitaxial Sc1-xVxNy thin film samples were deposited on MgO(001) substrates. All the samples showed N substoichiometry and pseudocubic crystal structure. The N-vacancy-induced states were visible in the Sc 2p XAS spectra. The reference ScN and Sc1-xVxNy samples up to x = 0.12 were n type, exhibiting carrier concentration of 1021 cm-3, typical for degenerate semiconductors. For the highest V alloying of x = 0.15, holes became the majority charge carrier as indicated by the positive Seebeck coefficient. The underlying electronic structure and bonding mechanism in Sc1-xVxNy influence the electrical resistivity, Seebeck coefficient, and Hall effect. Thus, the work contributes to the fundamental understanding of the correlated defects and thermoelectric properties to the electronic structure in Sc-N system with V alloying.

cond-mat.mtrl-sci

Effects of W alloying on the electronic structure, phase stability and thermoelectric power factor in epitaxial CrN thin films

CrN-based alloy thin films are of interest as thermoelectric materials for energy harvesting. Ab initio calculations show that dilute alloying of CrN with 3 at.% W substituting Cr, induce flat electronic bands and push the Fermi level EF into the conduction band, while retaining dispersive Cr 3d bands. These features are conducive for both high electrical conductivity \sigma and high Seebeck coefficient \alpha, and hence the thermoelectric power factor {\alpha}^2\sigma. To investigate this possibility, epitaxial CrWxNz films were grown on c-plane sapphire by dc-magnetron sputtering. However, even films with the lowest W concentration (x = 0.03) in our study contained metallic h-Cr2N, which is not conducive for a high \alpha. Nevertheless, the films exhibit a sizeable power factor of {\alpha}^2\sigma ~ 4.7 x 10-4 Wm-1K-2 due to high \sigma ~ 700 Scm-1, and a moderate \alpha ~ -25 ~{^^^^00b5}V/K. Increasing h-Cr2N fractions in the 0.03 < x \le 0.19 range monotonically increases \sigma, but severely diminishes \alpha leading to two orders of magnitude decrease in {\alpha}^2\sigma. This trend continues with x > 0.19 due to W precipitation. These findings indicate that dilute W additions below its solubility limit in CrN is important for realizing high thermoelectric power factor in CrWxNz alloy films.

cond-mat.mtrl-sci

Thermoelectric properties and electronic structure of Cr(Mo,V)Nx thin films studied by synchrotron and lab-based X-ray spectroscopy

Chromium-based nitrides are used in hard, resilient coatings, and show promise for thermoelectric applications due to their combination of structural, thermal, and electronic properties. Here, we investigated the electronic structures and chemical bonding correlated to the thermoelectric properties of epitaxially grown chromium-based multicomponent nitride Cr(Mo,V)Nx thin films. Due to minuscule N vacancies, finite population of Cr 3d and N 2p states appear at the Fermi level and diminishes the band opening for Cr0.51N0.49. Incorporating holes by alloying V in N deficient CrN matrix results in enhanced thermoelectric power factor with marginal change in the charge transfer of Cr to N compared to Cr0.51N0.49. Further alloying Mo isoelectronic to Cr increases the density of states across the Fermi level due to hybridization of the (Cr, V) 3d and Mo 4d-N 2p states in Cr(Mo,V)Nx. The hybridization effect with reduced N 2p states off from stoichiometry drives the system towards metal like electrical resistivity and reduction in Seebeck coefficient compensating the overall power factor still comparable to Cr0.51N0.49. The N deficiency also depicts a critical role in reduction of the charge transfer from metal to N site. The present work envisages ways for enhancing thermoelectric properties through electronic band engineering by alloying and competing effects of N vacancies.

cond-mat.mtrl-sci