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arXiv · 2606.01345

High-quality Nano-patterning of Oxide Interfaces Using Transferred Gold Mask

Qing Xiao·Yanling Liu·Changjian Ma·Danqing Liu·Zhiyuan Qin·Qianyi Zhao·Chengyuan Huang·Mengke Ha·Zhenhao Li·Guanglei Cheng
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Abstract

Complex oxide interfaces, such as $\mathrm{SrTiO_3}$ and $\mathrm{KTaO_3}$ based heterostructures, host rich correlated phenomena with strong potential for advanced device applications. However, these interfaces are extremely susceptible to contamination and defect formation during nanofabrication, which often compromises device performance. Here, we present a solvent-free method for patterning oxide interfaces by employing high-resolution transferable thin metal masks in conjunction with oxygen-enriched $\mathrm{Ar^+}$ ion milling, which enables a clean and well-controlled nanofabrication process. Transport measurements demonstrate that the fabricated devices preserve their intrinsic properties, including high carrier mobilities, with negligible degradation compared to the pristine interfaces. This technique offers a convenient and robust route for engineering high-performance oxide electronic devices with precisely tailored transport characteristics.

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Qing Xiao, Yanling Liu, Changjian Ma, Danqing Liu, Zhiyuan Qin, Qianyi Zhao, Chengyuan Huang, Mengke Ha, Zhenhao Li, Guanglei Cheng. 2026-05-31. High-quality Nano-patterning of Oxide Interfaces Using Transferred Gold Mask. https://doi.org/10.1021/acsami.6c09514

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